CVD Equipment

CVD, or chemical vapor deposition, is one technique for making thin films. Gas containing components needed for different membranes are exposed to heated substrates, resulting in the deposition of a membrane by chemical reaction on the substrate surface.

Etching Equipment

Etching is a surface processing method that uses the corrosive effect of a chemical solution or reactive gas. In semiconductor manufacturing it is used as a method to remove thin films in the patterning process of wafers. There is dry etching, which uses gas turned into plasma to accelerate ions to scrape away film by scientific reaction, and wet etching, which utilizes the corrosive effects of acid and alkali.